Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Jong-Taek Hwang0
Date of Patent
March 8, 2011
0Patent Application Number
122550520
Date Filed
October 21, 2008
0Patent Primary Examiner
Patent abstract
A semiconductor device includes a pattern layer formed on and/or over a semiconductor substrate, a fluorine-diffusion barrier layer containing a silicon-doped silicon oxide formed on and/or over the pattern layer, and an interlayer dielectric layer containing fluorine formed on and/or over the fluorine-diffusion barrier layer.
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