US Patent 7905963 Apparatus and method for washing polycrystalline silicon
Patent 7905963 was granted and assigned to Mitsubishi Materials on March, 2011 by the United States Patent and Trademark Office.
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Disclosed is a polycrystalline silicon washing apparatus that sequentially immerses polycrystalline silicon into a plurality of acid baths each of which is filled with an acid to wash the polycrystalline silicon. The temperatures of the acids in the acid baths are set such that the temperature of the acid in a later acid bath of adjacent acid baths is equal to or lower than that of a former acid bath and the temperature of the acid in the last acid bath is lower than that of the acid in the first acid bath. Each of the acid baths is provided with a temperature adjusting unit that controls the temperature of the acid at a constant value.
US Patent 07905963 Apparatus and method for washing polycrystalline silicon US Patent 7905963 Apparatus and method for washing polycrystalline silicon
US Patent 07905963 Apparatus and method for washing polycrystalline silicon
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