US Patent 7906270 Reduced pitch multiple exposure process
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Patent abstract
A lithographic method to enhance image resolution in a lithographic cluster using multiple projections and a lithographic cluster used to project multiple patterns to form images that are combined to form a patterned image having enhanced resolution.
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US Patent 07906270 Reduced pitch multiple exposure process US Patent 7906270 Reduced pitch multiple exposure process
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Patent Number
0790627000
Patent Number
790627000
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Patent Jurisdiction
Patent Number
079062700
Date of Patent
March 15, 2011
0Patent Application Number
110866640
Date Filed
March 23, 2005
0Official Website
Patent Primary Examiner
Edits on 23 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
079062700
Date of Patent
March 15, 2011
0Patent Application Number
110866640
Date Filed
March 23, 2005
0Official Website
Patent Primary Examiner
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US Patent 07906270 Reduced pitch multiple exposure process
Infobox
Is a
Patent jurisdiction
Patent number
07906270
Date of patent
March 15, 2011
Patent application number
11086664
Date Filed
March 23, 2005
Patent primary examiner
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