Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
March 15, 2011
Patent Application Number
11994240
Date Filed
October 17, 2006
Patent Primary Examiner
Patent abstract
An exposure apparatus (1) has a projection optical system (30) for projecting a pattern of a reticle onto a substrate, and exposes the substrate (40) via a liquid supplied in a space between the projection optical system (30) and the substrate (40). The exposure apparatus includes a gas curtain producer having two gas supply ports (103a, 103b) for supplying a gas to a circumference of the liquid and for limiting the liquid, the two gas supply ports (103a, 103b) supplying different types of gases (PG1, PG2).
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