US Patent 7907804 Elimination of stitch artifacts in a planar illumination area
Patent 7907804 was granted and assigned to OREE (real estate company) on March, 2011 by the United States Patent and Trademark Office.
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Patent abstract
In one aspect, a planar illumination area includes two light-guide elements, each with an out-coupling region. At least a portion of each out-coupling region overlaps with at least a portion of the other. The overlapping region emits a substantially uniform light output power.
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US Patent 07907804 Elimination of stitch artifacts in a planar illumination area US Patent 7907804 Elimination of stitch artifacts in a planar illumination area
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Patent Number
0790780400
Patent Number
790780400
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
079078040
Date of Patent
March 15, 2011
0Patent Application Number
123245550
Date Filed
November 26, 2008
0Official Website
Patent Primary Examiner
Edits on 24 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
079078040
Date of Patent
March 15, 2011
0Patent Application Number
123245550
Date Filed
November 26, 2008
0Official Website
Patent Primary Examiner
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US Patent 07907804 Elimination of stitch artifacts in a planar illumination area
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07907804
Date of patent
March 15, 2011
Patent application number
12324555
Date Filed
November 26, 2008
Patent primary examiner
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