Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Robert David Allen0
Linda Karin Sundberg0
Ratnam Sooriyakumaran0
Date of Patent
March 22, 2011
0Patent Application Number
121281290
Date Filed
May 28, 2008
0Patent Primary Examiner
Patent abstract
A method of forming an image using a topcoat composition. A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.
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