Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Peng Jin0
Kyle Jiang0
Date of Patent
March 22, 2011
0Patent Application Number
105820330
Date Filed
December 1, 2004
0Patent Primary Examiner
Patent abstract
The present invention provides a lithographic process for producing high aspect ratio parts from an epoxy-type negative photoresist comprising the steps of: (i) irradiating a prebaked masked epoxy-type negative photoresist on a substrate with light at a total energy density of from 18,000 to 35,000 mJ/cm2, (ii) post-baking the exposed photoresist at elevated temperature, and (iii) developing the exposed photoresist in a solvent, wherein no more than 15% of the energy density is contributed by light having a wavelength of 400 nm or less. The invention also discloses a reciprocating microengine (10) comprising a cylinder (14), piston (12) and crankshaft made by the process.
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