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US Patent 7914626 Liquid processing method and liquid processing apparatus

Patent 7914626 was granted and assigned to Tokyo Electron on March, 2011 by the United States Patent and Trademark Office.

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Patent abstract

A liquid processing method includes: placing a plate adjacently to at least one of surfaces of a target substrate, and supplying a process liquid into a gap between the plate and the target substrate, thereby forming a liquid film of the process liquid; subjecting the target substrate to a process using a state with the liquid film of the process liquid thus formed; and supplying a gas to the liquid film, thereby breaking the liquid film, after finishing the process.

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Patent Citations Received
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US Patent 11791174 Semiconductor manufacturing apparatus and semiconductor manufacturing method
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Patent Inventor Names
Mitsunori Nakamori0
Noritaka Uchida0
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US Patent 07914626 Liquid processing method and liquid processing apparatus US Patent 7914626 Liquid processing method and liquid processing apparatus

Infobox
Patent Number
079146260
Patent Number
79146260
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=079146260
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Infobox
Is a
Patent
Patent
0
Current Assignee
Tokyo Electron
Tokyo Electron
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
079146260
Date of Patent
March 29, 2011
0
Patent Application Number
116023980
Date Filed
November 21, 2006
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=079146260
Patent Primary Examiner
‌
Michael Kornakov
0
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=07914626
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 US Patent 07914626 Liquid processing method and liquid processing apparatus

Infobox
Is a
Patent
Patent
Current assignee
Tokyo Electron
Tokyo Electron
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
07914626
Date of patent
March 29, 2011
Patent application number
11602398
Date Filed
November 21, 2006
Patent primary examiner
‌
Michael Kornakov

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