Patent attributes
A near-field exposure method in which an exposure mask having a light blocking film with an opening smaller than a wavelength of light from an exposure light source is used, and an object is exposed by near-field light produced at the opening of the exposure mask based on the exposure light from the exposure light source. A width of the opening is determined to satisfy equations (1), (2) and (3) below, wherein the width of the opening of the exposure mask is denoted by s (nm), a processing pitch of the object to be exposed is denoted by p (nm) and coefficients are denoted by a and b:s=ap−b (1)0.46≦a≦0.58 (2)3≦b≦13 (3)The exposure mask having the opening with the determined width is provided, and the exposure light is projected to the exposure mask to thereby expose the object to be exposed.
