Patent attributes
A method of cleaning at least a portion of an exposure system's substrate-holding member. The method involves using the substrate-holding member to hold a cleaning member having substantially the same external shape as a substrate processed with the exposure system. The outer diameter of the cleaning member is smaller than the outer diameter of the substrate processed with the exposure system, and as a result, when the substrate-holding member holds the cleaning member, a gap is provided from the outer diameter of the cleaning member to another member which surrounds the substrate when the substrate-holding member is used to hold a substrate. Liquid is supplied to a space over the gap in order to clean at least a portion of the substrate-holding member.
