Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
April 19, 2011
Patent Application Number
11252885
Date Filed
October 19, 2005
Patent Citations Received
Patent Primary Examiner
Patent abstract
A plasma processing apparatus including a sealable chamber that is sealable, a gas supply section that supplies a reactive material gas into the chamber, and a plurality of cathode and anode electrode pairs provided within the chamber, connected to an external power supply, and producing plasma discharges through the material gas, respectively, wherein the plurality of cathode and anode electrode pairs are provided at a distance from one another at which the plasma discharges are prevented from interfering with one another.
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