Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Feng-Cheng Hsu0
Chun-Kuang Chen0
Date of Patent
May 3, 2011
0Patent Application Number
119484440
Date Filed
November 30, 2007
0Patent Primary Examiner
Patent abstract
A method of lithography patterning includes forming a first resist pattern on a substrate, the first resist pattern including at least one opening therein on the substrate; curing the first resist pattern; forming a second resist pattern on the substrate; forming a material layer on the substrate; and removing the first and second resist patterns to expose the substrate.
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