Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chung Woh Lai0
Jong Ho Yang0
Jin-Ping Han0
Henry Utomo0
Date of Patent
May 3, 2011
0Patent Application Number
123663560
Date Filed
February 5, 2009
0Patent Primary Examiner
Patent abstract
Embodiments of the present disclosure provide stress optimization during manufacturing of dual embedded epitaxially grown (EPI) semiconductor structures using just two masks, such as nFET and pFET open for embedded epitaxial using SiC and SiGe, and separated halo implantation masks for both horizontal and vertical PC
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