Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Daisuke Watanabe0
Date of Patent
May 3, 2011
0Patent Application Number
121443600
Date Filed
June 23, 2008
0Patent Primary Examiner
Patent abstract
A focused ion beam (FIB) processing system includes a FIB irradiation unit that irradiates a FIB onto a pattern formed in a wafer, to form a section of the pattern, an imaging unit that images the section of the pattern, a calculation unit that calculates a pattern size based on the image of the section, a judgment unit that judges whether or not a differential of the pattern size with respect to time is equal to or below a threshold; and a control unit that stops the FIB irradiation unit if the judgment unit judges that the differential of the pattern size is equal to or below the threshold.
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