Is a
Patent attributes
Current Assignee
0
Patent Jurisdiction
Patent Number
Patent Inventor Names
David C. Wang0
Pankaj B. Lad0
Van N. Truskett0
Wesley D. Martin0
Christopher J. Mackay0
Edward B. Fletcher0
Frank Y. Xu0
Ian M. McMackin0
...
Date of Patent
May 10, 2011
0Patent Application Number
109192240
Date Filed
August 16, 2004
0Patent Citations Received
Patent Primary Examiner
Patent abstract
The present invention includes a method and a composition to form a layer on a substrate having uniform etch characteristics. To that end, the method includes controlling variations in the characteristics of a solid layer, such etch characteristics over the area of the solid layer as a function of the relative rates of evaporation of the liquid components that comprise the composition from which the solid layer is formed.
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