US Patent 7939400 Systems and methods that selectively modify liner induced stress
Patent 7939400 was granted and assigned to Texas Instruments on May, 2011 by the United States Patent and Trademark Office.
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Patent abstract
The present invention facilitates semiconductor fabrication by providing methods of fabrication that selectively apply strain to multiple regions of a semiconductor device. A semiconductor device having one or more regions is provided (102). A strain inducing liner is formed over the semiconductor device (104). A selection mechanism, such as a layer of photoresist or UV reflective coating is applied to the semiconductor device to select a region (106). The selected region is treated with a stress altering treatment that alters a type and/or magnitude of stress produced by the selected region (108).
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Patent Inventor Names
Haowen Bu0
Robert Kraft0
Satyavolu S. Papa Rao0
Ting Tsui0
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US Patent 07939400 Systems and methods that selectively modify liner induced stress US Patent 7939400 Systems and methods that selectively modify liner induced stress
Infobox
Patent Number
079394000
Patent Number
79394000
Edits on 28 Apr, 2023
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
079394000
Date of Patent
May 10, 2011
0Patent Application Number
122357660
Date Filed
September 23, 2008
0Patent Primary Examiner
Edits on 7 Dec, 2021
Golden AI
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Infobox (+8 properties)
US Patent 07939400 Systems and methods that selectively modify liner induced stress
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07939400
Date of patent
May 10, 2011
Patent application number
12235766
Date Filed
September 23, 2008
Patent primary examiner
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