Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Janos Farkas0
Date of Patent
May 10, 2011
Patent Application Number
11914870
Date Filed
May 25, 2005
Patent Primary Examiner
Patent abstract
A cleaning solution for a semiconductor wafer comprises ammonia, hydrogen peroxide, a complexing agent and a block copolymer surfactant diluted in water. The cleaning solution can be used in single wafer cleaning tools to remove both particulate contaminants and metallic residues.
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