Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Alan M. Schoepp0
Andrew D. Bailey, III0
Gregory Sexton0
William S. Kennedy0
Yunsang Kim0
Date of Patent
May 17, 2011
Patent Application Number
11698190
Date Filed
January 26, 2007
Patent Citations Received
Patent Primary Examiner
Patent abstract
A device for cleaning a bevel edge of a semiconductor substrate. The device includes: a lower support having a cylindrical top portion; a lower plasma-exclusion-zone (PEZ) ring surrounding the outer edge of the top portion and adapted to support the substrate; an upper dielectric component opposing the lower support and having a cylindrical bottom portion; an upper PEZ ring surrounding the outer edge of the bottom portion and opposing the lower PEZ ring; and at least one radiofrequency (RF) power source operative to energize process gas into plasma in an annular space defined by the upper and lower PEZ rings, wherein the annular space encloses the bevel edge.
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