A non-volatile memory device and method for manufacture and programing which does not require a control gate for the programing or erasure of the device. The memory device is comprised of two wells with the opposite conductivity type of the semiconductor body. In one of the wells is a source and drain well of the same conductivity type as of the body. A oxide is formed on the surface of the body on which a floating gate is formed. Specific voltages are applied to the source, drain, first well and second well region to program, erase and read the memory device.