Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
May 24, 2011
Patent Application Number
11665757
Date Filed
October 13, 2005
Patent Primary Examiner
Patent abstract
A production method of a film of the present invention is a production method of a film, in which after a polymer base is wound off, metal is evaporated, and an oxygen gas is introduced and the inorganic compound layer is formed in an excitation atmosphere of an organic silicon compound containing gas when an inorganic compound layer is formed on the surface of a polymer base. The production method of a film of the present invention can produce a film having a high gas barrier property against an oxygen gas, a water vapor and the like.
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