Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Miyoko Kawashima0
Date of Patent
May 24, 2011
0Patent Application Number
125399630
Date Filed
August 12, 2009
0Patent Primary Examiner
Patent abstract
An exposure method includes the steps of illuminating a mask that has a contact hole pattern using an illumination light, and projecting, via a projection optical system, the contact hole pattern onto a substrate to be exposed, wherein three lights among diffracted lights from the contact hole pattern interfere with each other, wherein said mask is an attenuated phase shift mask, and wherein said illumination light forms a radial polarization illumination.
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