US Patent 7948259 Dielectric film and layer testing
Patent 7948259 was granted and assigned to Infineon Technologies on May, 2011 by the United States Patent and Trademark Office.
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Patent abstract
A system for testing and a method for making a semiconductor device is disclosed. A preferred embodiment includes a conductor overlying a dielectric layer. The conductor is coupled to a first test pad via a first conducting line and to a second test pad via a second conducting line.
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Patent Inventor Names
Andrea Mitchell0
Andreas Martin0
Karl-Henrik Rydén0
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US Patent 07948259 Dielectric film and layer testing US Patent 7948259 Dielectric film and layer testing
Infobox
Patent Number
07948259
Patent Number
7948259
Edits on 7 Dec, 2021
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US Patent 07948259 Dielectric film and layer testing
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07948259
Date of patent
May 24, 2011
Patent application number
12898268
Date Filed
October 5, 2010
Patent primary examiner
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