US Patent 7949237 Heating configuration for use in thermal processing chambers
Patent 7949237 was granted and assigned to Mattson Technology on May, 2011 by the United States Patent and Trademark Office.
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Patent abstract
An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the present invention, tuning devices which are used to adjust the overall irradiance distribution of the light energy sources are included in the heating device. The tuning devices can be, for instance, are lamps or lasers.
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Patent Inventor Names
Arieh A. Strod0
Conor Patrick O'Carroll0
James Tsuneo Taoka0
Paul Janis Timans0
Rudy Santo Tomas Cardema0
Shuen Chun Choy0
Zion Koren0
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US Patent 07949237 Heating configuration for use in thermal processing chambers US Patent 7949237 Heating configuration for use in thermal processing chambers
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Patent Number
079492370
Patent Number
79492370
Edits on 27 Mar, 2023
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Is a
Current Assignee
Patent Jurisdiction
Patent Number
079492370
Date of Patent
May 24, 2011
0Patent Application Number
118534140
Date Filed
September 11, 2007
0Patent Primary Examiner
Edits on 7 Dec, 2021
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US Patent 07949237 Heating configuration for use in thermal processing chambers
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07949237
Date of patent
May 24, 2011
Patent application number
11853414
Date Filed
September 11, 2007
Patent primary examiner
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