Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Bu-Il Jeon0
Date of Patent
May 31, 2011
0Patent Application Number
114623130
Date Filed
August 3, 2006
0Patent Citations Received
Patent Primary Examiner
Patent abstract
The present invention relates to a plasma etching apparatus. In the apparatus, potential difference is applied between a substrate support with a substrate seated thereon and a electrode surrounding an edge region of the substrate, and a distance between the substrate and the electrode is set to 3 mm or less so as to locally generate plasma in an area between the substrate and the electrode, thereby removing particles and a thin film in the edge region of the substrate.
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