US Patent 7951719 Self-masking defect removing method
Patent 7951719 was granted and assigned to Hrl Laboratories, Llc on May, 2011 by the United States Patent and Trademark Office.
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Patent abstract
A method for removing defects from a semiconductor surface is disclosed. The surface of the semiconductor is first coated with a protective layer, which is later thinned to selectively reveal portions of the protruding defects. The defects are then removed by etching. Finally, also the protective layer is removed. According to the method, inadvertent thinning of the surface is prevented and removal of the defects is obtained.
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Patent Inventor Names
Peter D. Brewer0
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US Patent 07951719 Self-masking defect removing method US Patent 7951719 Self-masking defect removing method
Infobox
Patent Number
079517190
Patent Number
79517190
Edits on 6 Apr, 2023
Golden AI
Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
079517190
Date of Patent
May 31, 2011
0Patent Application Number
124120090
Date Filed
March 26, 2009
0Patent Primary Examiner
Edits on 7 Dec, 2021
Golden AI
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Infobox (+8 properties)
US Patent 07951719 Self-masking defect removing method
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07951719
Date of patent
May 31, 2011
Patent application number
12412009
Date Filed
March 26, 2009
Patent primary examiner
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