Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Weng-Jin Wu0
Ching-Ya Wang0
Henry Lo0
Jean Wang0
Date of Patent
May 31, 2011
Patent Application Number
11552364
Date Filed
October 24, 2006
Patent Primary Examiner
Patent abstract
A method and apparatus involve providing a substrate having a dielectric layer formed thereon, forming a photoresist mask over the dielectric layer, the photoresist mask defining an opening, etching the dielectric layer through the at least one opening in the photoresist mask, treating a portion of the photoresist mask with an etching species, and removing the treated photoresist mask with a supercritical fluid. The etching, treating, and removing can be performed in one chamber.
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