Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Xinliang Lu0
Chien-Teh Kao0
Reza Arghavani0
Date of Patent
June 7, 2011
Patent Application Number
12642268
Date Filed
December 18, 2009
Patent Primary Examiner
Patent abstract
The present invention generally provides apparatus and methods for selectively removing various oxides on a semiconductor substrate. One embodiment of the invention provides a method for selectively removing an oxide on a substrate at a desired removal rate using an etching gas mixture. The etching gas mixture comprises a first gas and a second gas, and a ratio of the first gas and a second gas is determined by the desired removal rate.
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