US Patent 7955977 Method of light induced plating on semiconductors
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Patent abstract
Methods of light induced plating of nickel onto semiconductors are disclosed. The methods involve applying light at an initial intensity for a limited amount of time followed by reducing the intensity of the light for the remainder of the plating period to deposit nickel on a semiconductor.
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Patent Inventor Names
David L. Jacques0
Gary Hamm0
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US Patent 07955977 Method of light induced plating on semiconductors US Patent 7955977 Method of light induced plating on semiconductors
Infobox
Patent Number
079559770
Patent Number
79559770
Edits on 26 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
079559770
Date of Patent
June 7, 2011
0Patent Application Number
124567900
Date Filed
June 23, 2009
0Patent Primary Examiner
Edits on 7 Dec, 2021
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US Patent 07955977 Method of light induced plating on semiconductors
Infobox
Is a
Patent jurisdiction
Patent number
07955977
Date of patent
June 7, 2011
Patent application number
12456790
Date Filed
June 23, 2009
Patent primary examiner
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