US Patent 7957931 Positioning pattern

An absolute position detection device, system and method using a pattern comprising two types of position data: location of the pattern relative an object and position of the pattern relative a sensing device, e.g. a camera. The device comprise the sensing device acquiring images of the pattern located on the object and a computational unit analysing the images for determining absolute position of the object relative the sensing device. The present invention is realized in a number of applications, such as forming part of a torque sensor, a theodolite, an articulating arm, or an angular detector.