Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yi-Ming Dai0
Chi-Hung Liao0
Chun-Hung Kung0
Wei-Yu Su0
Date of Patent
June 28, 2011
Patent Application Number
11129968
Date Filed
May 16, 2005
Patent Primary Examiner
Patent abstract
A method for photolithography in semiconductor manufacturing includes providing one or more masks for a wafer; defining a reference focus plane of a first mask of the one or more masks; defining a reference focus plane of a second mask of the one or more masks; and determining the best focus for the second mask based on the best focus of the first mask and the Z direction difference of the first and second masks, using the reference focus planes of the first and second masks.
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