Is a
Patent attributes
Current Assignee
0
Patent Jurisdiction
Patent Number
Patent Inventor Names
Masahiro Hashimoto0
Date of Patent
July 5, 2011
0Patent Application Number
120976990
Date Filed
December 18, 2006
0Patent Primary Examiner
Patent abstract
The mask blank is patterned to form a corresponding mask having a light shielding film pattern with enhanced resolution. A mask blank (10) on which a chemically amplified resist film (20) is formed, the mask blank (10) comprising a substrate (12), a light shielding film (13) provided on the substrate (12), and a resist underlying film (18) provided on the light shielding film (13), for suppressing the deactivation of the chemically amplified resist film (20). When the light shielding film (13) is etched using the patterned chemically amplified resist film (20) as a mask, the etching rate of the deactivation preventive film (18) is higher than the etching rate of the chemically amplified resist film (20).
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