Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
July 5, 2011
Patent Application Number
12252455
Date Filed
October 16, 2008
Patent Citations Received
0
Patent Primary Examiner
Patent abstract
A method for manufacturing a semiconductor device includes forming an ONO layer in a memory region and forming several gate oxide layer patterns in a logic region, a nitride layer in the logic region can be used as a hard mask, enabling a reduction in the number of masks used. This results in improved manufacturing efficiency and reduced manufacturing costs of a SONOS semiconductor device.
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