US Patent 7977028 Photosensitive resin composition and adhesion promoter
Patent 7977028 was granted and assigned to Toray Industries on July, 2011 by the United States Patent and Trademark Office.
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Patent abstract
The present invention provides a photosensitive resin composition comprising (a) an alkali-soluble resin, (b) a silicon compound having a secondary aromatic amino group and an alkoxy group, and (c) at least one selected from a photopolymerization initiator, a photo acid generator and a photo base generator. According to the present invention, it is possible to obtain a photosensitive resin composition which remarkably enhances the adhesion property with a substrate after curing without deteriorating storage stability of a solution, and does not cause peeling of a fine pattern even upon development.
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Patent Inventor Names
Masao Tomikawa0
Tomoyuki Yuba0
Yoji Fujita0
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US Patent 07977028 Photosensitive resin composition and adhesion promoter US Patent 7977028 Photosensitive resin composition and adhesion promoter
Infobox
Patent Number
079770280
Patent Number
79770280
Edits on 25 Apr, 2023
Golden AI
Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
079770280
Date of Patent
July 12, 2011
0Patent Application Number
119943000
Date Filed
April 18, 2006
0Patent Primary Examiner
Edits on 8 Dec, 2021
Golden AI
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Infobox (+8 properties)
US Patent 07977028 Photosensitive resin composition and adhesion promoter
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07977028
Date of patent
July 12, 2011
Patent application number
11994300
Date Filed
April 18, 2006
Patent primary examiner
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