Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Evelyn Scheer0
Roland Weber0
Udo Schreiber0
Oliver Graw0
Date of Patent
July 12, 2011
Patent Application Number
12884043
Date Filed
September 16, 2010
Patent Citations Received
Patent Primary Examiner
Patent abstract
A method for forming a thin-film transistor gate insulating layer over a substrate disposed in a processing chamber is provided. The method includes: introducing a processing gas for producing a plasma in the processing chamber; heating the substrate to a substrate processing temperature of between 50 and 350° C.; and depositing silicon oxide, silicon oxynitride, or silicon nitride over the heated substrate by sputtering a target assembly at a medium frequency.
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