Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tjarko Adriaan Rudolf Van Empel0
Emiel Jozef Melanie Eussen0
Marcel Hendrikus Maria Beems0
Date of Patent
July 12, 2011
0Patent Application Number
112421300
Date Filed
October 4, 2005
0Patent Primary Examiner
Patent abstract
A lithographic apparatus includes a position measurement system to determine along a measurement path a position of a first part of the lithographic apparatus with respect to a position of a second part of the lithographic apparatus. The position determination system comprises a plurality of temperature sensors to measure a temperature of a medium along the measurement path. The position measurement system corrects the determined position making use of the temperature as measured by the temperature sensors.
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