Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Nishant Sinha0
Date of Patent
July 19, 2011
0Patent Application Number
120350080
Date Filed
February 21, 2008
0Patent Primary Examiner
Patent abstract
Methods and apparatus for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing electrorheological (ER) and magnetorheological (MR) fluids to remove contaminant residual particles from the substrate surface are provided.
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