US Patent 7981286 Substrate processing apparatus and method of removing particles

Patent 7981286 was granted and assigned to Dainippon Screen Mfg Co on July, 2011 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

Dainippon Screen Mfg Co

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7981286

Date of Patent

July 19, 2011

Patent Application Number

11226640

Date Filed

September 14, 2005

Patent Citations Received

‌

US Patent 12102942 Method and system for buoyant separation

Patent Primary Examiner

‌

Thomas M Lithgow

Patent abstract

A liquid within a processing tank is caused to overflow, and the overflowing liquid is circulated by a circulation system. In this process, bubbles are discharged into the liquid within the processing tank. Thus, particles within the processing tank are not only carried along by a flow of the liquid but also attach to the bubbles to be carried with the bubbles outwardly of the processing tank. A dip-type substrate processing apparatus removes the particles within the processing tank in a short time with efficiency.

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