Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Sanjay Shinde0
Yoshimitsu Kodaira0
Tomoaki Osada0
Date of Patent
July 19, 2011
Patent Application Number
12852230
Date Filed
August 6, 2010
Patent Primary Examiner
Patent abstract
The present invention provides a method for manufacturing a resistance change element that can reduce occurrence of corrosion without increasing a substrate temperature. A laminate film that includes a high melting-point metal film and a metal oxide film, is etched using a mask under a plasma atmosphere formed using any one of a mixture gas formed by adding at least one gas selected from the group consisting of Ar, He, Xe, Ne, Kr, O2, O3, N2, H2O, N2O, NO2, CO and CO2 to at least one kind of gasified compound selected from alcohol and hydrocarbon or the gas compound.
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