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US Patent 7981989 Photopolymer-based dielectric materials and methods of preparation and use thereof

Patent 7981989 was granted and assigned to Polyera Corporation on July, 2011 by the United States Patent and Trademark Office.

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Patent abstract

Photopolymer-based dielectric materials are provided with methods for preparing the same. Composites and electronic devices including such dielectric materials also are provided.

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