Patent attributes
According to an aspect of the present invention, there is provided a semiconductor device including: first and second blocks that each includes a word line group of first to N-th word lines, the word lines extending in a given direction, the word lines having a first width, the first and second blocks being adjacent to and in parallel with each other in a crossing direction so that an inter-block area is interposed therebetween and so that the word line groups are symmetrical with respect to the inter-block area; and a first wirings that are formed in a first wiring layer positioned above the word lines to have a second width wider than the first width and that connect a k-th word line of the first block and a k-th word line of the second block.
