Patent attributes
A method of increasing hierarchy compression of a metal 1 standard cell layout during optical proximity correction (OPC) is provided. This method can use a context determination defined from the outermost OPC correctable-edge boundaries of a metal 1 standard cell and not extending past outermost OPC correctable edge boundaries of adjacent metal 1 standard cells in other rows. The method can also include (or can alternatively include) adjusting the landing pads (resulting from metal 2 placement) to fit within the lines of the metal 1 standard cell layout. This adjusting can be performed by a place and route tool as part of a “clean-up” operation after metal 2 placement. The landing pads can be sized for single or double vias. A layout design for the metal 1 standard cell layout can be output based on using the context determination and/or adjusting the landing pads for hierarchy compression.
