Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Eui-Gyu Kim0
Tae-Hyung Kim0
Date of Patent
August 2, 2011
0Patent Application Number
112806820
Date Filed
November 16, 2005
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A mask assembly configured to prevent the mask from being thermally transformed and to maintain gaps between a plurality of divided pattern masks is disclosed. According to one embodiment, the mask assembly comprises: an open mask that has a plurality of first openings arranged in rows and columns; and a pattern mask that comprises a plurality of unit pattern masks. In some embodiments, the ends of the unit pattern masks may be fixed with respect to the open mask, and the unit pattern mask includes a plurality of mask pattern units configured to align with the plurality of first openings of the open mask. In some embodiments, a tensile force is applied to the unit pattern mask(s).
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