Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 2, 2011
Patent Application Number
11644927
Date Filed
December 21, 2006
Patent Primary Examiner
Patent abstract
A method for a magneto-optical photoresist. The method includes applying a magneto-optical photoresist to a surface, and patterning the magneto-optical photoresist by using a magnetic alignment. The magneto-optical photoresist is also patterned by using a photo exposure, wherein the magnetic alignment provides a photo exposure alignment for the photo exposure.
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