Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 2, 2011
Patent Application Number
12458321
Date Filed
July 8, 2009
Patent Primary Examiner
Patent abstract
The present invention provides an SOS wafer comprising a non-transparent polysilicon layer provided on a back surface of a sapphire substrate, a silicon nitride layer which protects the polysilicon layer, and a stress relaxing film which cancels stress produced in the silicon nitride layer, wherein the silicon nitride layer and the stress relaxing film are provided on the back surface side.
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