US Patent 7989560 Fluorine-containing polymer and resin composition
Patent 7989560 was granted and assigned to Chisso on August, 2011 by the United States Patent and Trademark Office.
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A polymer containing: a constitutional unit A that is derived from fluorosilsesquioxane having one addition polymerizable functional group in a molecule; a constitutional unit B that is derived from organopolysiloxane having an addition polymerizable functional group; and a constitutional unit C that is derived from an addition polymerizable functional monomer containing a group having active hydrogen, and optionally containing a constitutional unit D that is derived from an addition polymerizable monomer other than the fluorosilsesquioxane having one addition polymerizable functional group in a molecule, the organopolysiloxane having an addition polymerizable functional group and the addition polymerizable monomer containing a group having active hydrogen.
US Patent 07989560 Fluorine-containing polymer and resin composition US Patent 7989560 Fluorine-containing polymer and resin composition
US Patent 07989560 Fluorine-containing polymer and resin composition
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