Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 2, 2011
Patent Application Number
12248777
Date Filed
October 9, 2008
Patent Citations Received
Patent Primary Examiner
Patent abstract
A method of measuring overlay between a first structure and a second structure on a substrate is provided. The structures include equidistant elements, such as parallel lines, wherein the equidistant elements of the first and second structure alternate. A design width CD1 of the elements of the first structure is different from a design width CD2 of the elements of the second structure. The difference in design width can be used to identify measurement points having incorrectly measured overlay errors.
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