Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Youichi Ohsawa0
Takeru Watanabe0
Takeshi Kinsho0
Date of Patent
August 9, 2011
Patent Application Number
12355446
Date Filed
January 16, 2009
Patent Primary Examiner
Patent abstract
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising specific recurring units, represented by formula (1). The acid generator (B) is a specific sulfonium salt compound. When processed by lithography, the composition is improved in resolution and forms a pattern with a satisfactory mask fidelity and a minimal LER.
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