US Patent 7998660 Exposure method
Patent 7998660 was granted and assigned to Nanya Technology Corporation on August, 2011 by the United States Patent and Trademark Office.
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Edits on 28 Nov, 2023
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Patent abstract
An exposure method is disclosed. A wafer coated with a photoresist layer having an exposure threshold dose is provided. The wafer has at least a central region and a peripheral region. Then, a compensating light beam having a first dose directs on the photoresist layer within the peripheral region. Next, a patterned light beam having a second dose is then projected, in a step-and-scan manner, onto the photoresist layer, thereby exposing the photoresist layer. The total dose of the first energy and the second energy is above than the exposure threshold dose.
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US Patent 07998660 Exposure method US Patent 7998660 Exposure method
Infobox
Patent Number
0799866000
Patent Number
799866000
Edits on 30 Mar, 2023
Golden AI
Infobox
Is a
Current Assignee
0
Patent Jurisdiction
Patent Number
079986600
Date of Patent
August 16, 2011
0Patent Application Number
122532350
Date Filed
October 16, 2008
0Patent Primary Examiner
Edits on 23 Sep, 2022
Golden AI
Infobox
Is a
Current Assignee
0
Patent Jurisdiction
Patent Number
079986600
Date of Patent
August 16, 2011
0Patent Application Number
122532350
Date Filed
October 16, 2008
0Patent Primary Examiner
Edits on 8 Dec, 2021
Golden AI
Edits made to:
Infobox (+8 properties)
US Patent 07998660 Exposure method
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07998660
Date of patent
August 16, 2011
Patent application number
12253235
Date Filed
October 16, 2008
Patent primary examiner
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