US Patent 7999334 Hafnium tantalum titanium oxide films
Patent 7999334 was granted and assigned to Micron Technology on August, 2011 by the United States Patent and Trademark Office.
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Patent abstract
Embodiments of a dielectric layer containing a hafnium tantalum titanium oxide film structured as one or more monolayers include the dielectric layer disposed in an integrated circuit. Embodiments of methods of fabricating such a dielectric layer provide a dielectric layer for use in a variety of electronic devices. An embodiment may include forming hafnium tantalum titanium oxide film using atomic layer deposition.
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US Patent 07999334 Hafnium tantalum titanium oxide films US Patent 7999334 Hafnium tantalum titanium oxide films
Infobox
Patent Number
0799933400
Patent Number
799933400
Edits on 25 Apr, 2023
Golden AI
Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
079993340
Date of Patent
August 16, 2011
0Patent Application Number
125635960
Date Filed
September 21, 2009
0Patent Primary Examiner
Edits on 28 Sep, 2022
Golden AI
Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
079993340
Date of Patent
August 16, 2011
0Patent Application Number
125635960
Date Filed
September 21, 2009
0Patent Primary Examiner
Edits on 8 Dec, 2021
Golden AI
Edits made to:
Infobox (+8 properties)
US Patent 07999334 Hafnium tantalum titanium oxide films
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07999334
Date of patent
August 16, 2011
Patent application number
12563596
Date Filed
September 21, 2009
Patent primary examiner
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