Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Martin Yeo0
Soo Muay Goh0
Sia Kim Tan0
Qunying Lin0
Date of Patent
August 23, 2011
0Patent Application Number
119728090
Date Filed
January 11, 2008
0Patent Primary Examiner
Patent abstract
An integrated circuit system that includes: providing a substrate coated with a photoresist material; exposing the photoresist material to an energy source through a first mask to form a first substrate feature and a second substrate feature therein; and exposing the photoresist material to the energy source through a second mask to transform the second substrate feature into another one of the first substrate feature therein.
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